etching
Etching is a process in semiconductor device manufacturing that uses chemicals to selectively remove specific portions of a deposited layer. Etching is very important for the electrical performance of the device. If errors occur during the etching process, the silicon wafer will be scrapped and will be difficult to recover, so strict process control must be carried out. Each layer of a semiconductor device undergoes multiple etching steps. Etching is generally divided into electron beam etching and photolithography. Photolithography has high requirements on the flatness of the material, so it requires a high degree of cleanliness. However, for electron beam etching, the resolution is much better compared to photolithography because the wavelength of electrons is extremely short. Because no mask is required, flatness requirements are not high, but electron beam etching is slow and the equipment is expensive.
Etching jars in the laboratory
For most etching steps, portions of the upper layer of the wafer are protected by a "mask" that cannot be etched, allowing specific portions of the layer to be selectively removed. In some cases, the mask material is photoresistive , similar to the principles used in photolithography . In other cases, the etching mask needs to be resistant to certain chemicals, and silicon nitride can be used to create such a "mask."
references
- ^ Michael Quirk, Julian Serda. . Electronic Industry Press. 2005: 404. ISBN 7-5053-9493-2.
- Jaeger, Richard C. . . Upper Saddle River: Prentice Hall. 2002. ISBN 0-201-44494-7 Please check
|isbn=value (Help). - Ibid, "Processes for MicroElectroMechanical Systems (MEMS)"
external link
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Related multimedia resources from Wikimedia Commons : Etching |
- BYU Cleanroom Chemical Etching ( page archive backup , stored in)
- Technology of wet etching ( page archive backup , stored in) of silicon and semiconductor wafers.
- Technology of dry etching ( page archive backup , stored in) or plasma etching of silicon and semiconductor wafers.
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