Experiment Series Sample Preparation

First, the glass substrate was washed

  Selection of the glass substrate with a diameter of 3 inches is generally circular glass plate, usually made of ordinary glass and quartz glass type 2, the former having a thickness of 0.5mm, the latter having a thickness of 0.8mm, so as to distinguish

  1. Prepare a large, medium and small petri dishes, two flask, a glass rod, which is formulated in the largest piranha water; inside the plasma discharge to water, which put a small ethanol

  2. with rubber gloves and disposable masks, petri dish, flask, water with a glass rod at the hood rinsed again, and then rinsed with deionized water, blown dry with nitrogen and finally take

  3. The glass substrate is removed from the package, placed in a Petri dish with tweezers (scattered place, to avoid bare hands)

  4. pick concentrated sulfuric acid and hydrogen peroxide, in a hood according to a ratio of about 2: 1 formulated

  The flask first by hydrogen peroxide to measure the amount of concentrated sulfuric acid, poured into a petri dish containing glass sheet, half concentrated and then taken by the amount of sulfuric acid in an amount of another flask, poured into a petri dish containing glass sheet , reacts with concentrated sulfuric acid, pull down the shutter window fume hood, stirring with a glass rod (MUST formulated in a fume hood, preparation of hydrogen peroxide sure to pour concentrated sulfuric acid, typically 50ml 25ml of concentrated sulfuric acid hydrogen peroxide)

  6. soak for 10 minutes

  7. Add deionized water No. dish (about half volume)

  8. picked up with tweezers in the glass cleaning solution, rinsed in a fume hood, the angle is about 60 degrees, a small stream of water, as much as possible to lower the glass tight against splashed ventilated table; to the surface to be cleaned without cleaning fluid residues before being placed in deionized water (commonly two tweezers, taking note of the washing water and the angle of the glass sheet, the gripping forceps cleaning attention at)

  9. After the end of the washing sequence, the petri dish containing glass sheet medium into ultrasonic cleaner, washing machine water dish about 1/3 of the height, to avoid the washing water into the dish

  10. A washing machine to open the switch, the power regulator 90 (far right), 4min time (power on the left)

  11. After washing, ethanol was placed into small Petri dishes, glass was immersed to make capacity

  12. The petri dish containing glass ethanol in an ultrasonic cleaning machine, with step 9,10

  13. During cleaning, the waste liquid is poured into the waste container, and used dishes washed, to be flushed out with nitrogen dry residue; waste container is placed in a fume hood opening, to be completed before the experiment sealing keep good;

  14. After the end of washing, the plates were removed, picked up with tweezers glass, blown dry with nitrogen (as not facing the front glass outlet should be blown directly along the front direction) to the small amount of liquid droplets to be dried when the residual, stuck by hand direct drying glass sheets, and finally into the storage box;

  15. After drying sequentially, glass sheet installed, the dish ethanol, deionized water directly into the tank, rinse off residual liquid, washing flask, washing the glass rod, and then blown dry with nitrogen

  16. The laboratory supplies all into place, finished cleaning the glass bottles to take away the waste bottle sealed storage.

  17. The disposable mask garbage, rubber gloves, air-laid paper or the like generated throw away the trash

Second, the coating film PI

 

Third, paste mask

Select the substrate

  1. PI film coating on a glass substrate

  2. PI labeled with a marker pen positive resist process parameters - speed, thickness

  3. The rear glass plate of PI film

Affixed pellicle

  1. Good pre-drawn two-dimensional map stored in a format dxf

  2. Reduction of the appropriate size, and attach it to the printing paper, with a hard object pressed cement

  3. Press the back of the printer wrench, lift the roller, into the paper, lift the wrench

  4. Power, open interface, the import file

  The layout, cutting parameters set, the intensity of the cutting attention to 6-7

  6. Start cutting

  7. The pellicle is affixed to the cut sides of the glass substrate, the side writing a tag attached to a film, paste just cut film PI film side

  8. The prepared test piece placed in petri dishes and labeled.

Fourth, the magneto-sputtering

Between West magnetron sputtering purification steps

  1. Open the compressed air or nitrogen (left), connect the Ar (fourth passage on the right, the switch to open to the vertical, as far as possible off the pressure reducing valve smaller (not more than 4), to prevent excessive pressure directly to the red Valve open recommended that relief valve counter-clockwise twist in the end, adjusting the flow of time and then slowly open it), open the power (power supply cabinet bottom left), water tank automatically open (alarm instructions, then recycled water did not open, in the first open water tank pump , and then open the compressor)
  2. Open the valve and let the sample, the target discharge (spin shield, unscrewing the four screws (M2.5), remove the lid a little clockwise), the sample in question has been removed baffle, closed note target shutter, closed chamber door
  3.关放气阀,开机械泵,开旁抽阀,开真空计,至压强为8Pa以下时,关旁抽阀,开电磁阀,开分子泵(直接按on,出现倒三角符号即开),(不必等待分子泵转速升到820,直接)开插板阀,继续抽真空(10-4pa)
  4.当抽到真空压强后,开流量显示仪电源(ON),等待示数稳定至0附近
  5.开进气阀,这个时候压强会上升,是因为混气室里的气体进入到了真空室,等待一会,等电离计压强不再上升开始下降,最好继续下降到5×10-3以下
  6.开截止间,跟步骤5一样,这个时候压强会上升,等待一会,等电离计压强不再上升开始下降,最好继续下降到5×10-3以下
  7.开阀控(流量仪的左边是Ar,阀控打到中间为开,阀控干万不要打到最左边的清洗了)等待一会儿,确定电离计上的压强没有上升时(在10-3),电离计打到手动,开节流阀(节流阀之前气缸装反了,所以现在操作跟之前是反的),调工艺气流量(Cu一般为28左右),至溅射压强(一般,Cu:0.8-1Pa)。
  8.开直流电源(A、C靶)或射频电源(B靶),调整溅射功率,按On,预溅射一定时间(3min);
  9.开步进电机电源,选择正转或者反转都行,开靶挡板,溅射,时间到后,关挡板,关步进电机,关直流电源或射频电源
  10.流量计示数置0后锁紧,等待流量仪示数稳定(到0附近),关阀控(打到右边),关流量计,关节流阀,等几秒钟,关截止阀,进气阀
  11.关Ar气(减压阀逆时针选到底,开关打到水平状态为关)
  12关插板阀,关分子泵(按下OFF即可,第一个灯开始闪烁,调至309或398可看实际频率或转速)至转速为0,时间较长(约50min)慢慢等待;注意,分子泵转速为0后才能关电磁阀),关电磁阀
  13关真空计,开放气阀,取样品和靶材,关腔门
  14.开真空计,关放气阀,开旁抽阀抽真空保护,抽到8Pa以下后关真空计,关旁抽阀,关机械泵,关电源,关压缩空气或者氮气(左边,只将开关打到水平即可);

五、试样制备结束,可进行实验。

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Origin www.cnblogs.com/Sonny-xby/p/11417619.html