Recently, the media has been rumoring that Tsinghua University has successfully developed an EUV lithography machine. This is actually an exaggeration of the fact, but it is indeed a major breakthrough for EUV lithography machine. It will bypass the EUV lithography technology route monopolized by Western countries such as ASML and open up a new path. .
It is understood that what Tsinghua University has successfully developed is not an EUV lithography machine, but a light source that can be used in EUV lithography machines. This is called SSMB (Steady State Micro-Bunch Accelerator Light Source). It is understood that Tang Chuanxiang, who is responsible for the research and development of this technology at Tsinghua University, The professor also clearly pointed out that "one of the potential applications of SSMB light source is as a light source for future EUV lithography machines."
EUV lithography machines are necessary equipment for the development of 5-nanometer and even more advanced processes. Currently, the 5-nanometer and 3-nanometer processes mass-produced by TSMC, Intel, and Samsung require EUV lithography machines. Although DUV lithography machines can also be used for 7-nanometer processes, they are not As a result, the performance is not strong enough for the 7nm EUV process, and the yield rate is low and the cost is high.
Currently EUV lithography machines are monopolized by ASML, while EUV lithography technology is monopolized by Europe and the United States. At that time, the United States jointly developed many companies to successfully develop EUV lithography technology, and then provided it to ASML, which produced EUV lithography machines. It is precisely because of this Technical origin, so ASML has to comply with the requirements of the United States and not sell EUV lithography machines to China.
At present, due to the influence of the United States, it is estimated that ASML will not sell EUV lithography machines to China for a long time. This and DUV lithography machines can also be classified. Low-level DUV lithography machines can be sold to China, prompting China to organize various Fang experts develop their own EUV lithography machines.
It is difficult for China to develop a new EUV lithography technology. This is not just a matter of one or two companies, but requires the joint efforts of many industrial chain companies in China. Now Tsinghua University has developed a new EUV light source technology, which is very important for China. This is a major breakthrough for EUV lithography machines, which means that China has made breakthrough progress in developing its own EUV lithography machines.
An EUV lithography machine not only has a light source, but also light source control, workbench, objective lens system, etc. However, the technical development of the light source is the most difficult. After all, the light source of the EUV lithography machine is completely different from the previous DUV lithography machine. It is an innovative technology. If the light source has a solution, the research and development of other lithography machine accessories can be accelerated. After all, some of the technologies of other components are similar to those of DUV lithography machines.
It has been reported earlier that a domestically produced 28nm lithography machine has been successfully developed, and recently a domestic mobile phone brand launched a chip produced by a domestic chip manufacturing process, proving that the domestically produced advanced lithography machine should have been put into production, half a year earlier than expected. Time, this also shows that the industrial chain of lithography machines has been improved, and these technologies will help accelerate the research and development of EUV lithography machines.
Domestic lithography machine technology has developed explosively this year, and news of breakthroughs continues, highlighting that since China attached great importance to the research and development of lithography machines more than 3 years ago, it has achieved such a huge breakthrough in such a short period of time, which proves that China's chip technology There are indeed enough talents, and no difficulty can stop the progress of Chinese chips.
Facing the progress of China's chip technology, ASML executives' comments on Chinese lithography machines are constantly changing. They previously said that even if they gave China drawings, they would not be able to produce lithography machines. Now they have said that as long as China is given time, China will be able to produce them sooner or later. Advanced lithography machines, and the mass production of domestic advanced chip technology confirmed their expectations. ASML also quickly changed its attitude and stated that it could sell more advanced 2000i lithography machines to China.
Facts have shown that once China's independent research and development technology breaks through, Europe and the United States will quickly lower the restriction threshold. This reminds the Chinese chip industry that it needs to strengthen independent research and development. Only independently developed technology is reliable.